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Polarization Analysis of Optical Systems Using the Mueller Matrix

Join us for a webinar introducing a new workflow integrated into Ansys Zemax OpticStudio to simplify obtaining an effective Mueller matrix. This allows users to rapidly create Mueller matrix maps, enhancing polarization control, image quality, and the overall design efficiency of optical systems.

TIME:
October 10, 2024
Session 1: 9am EDT
Session 2: 11am EDT

Venue:
Virtual

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Overview

Polarization analysis is essential in optical system design, such as in microscopy or display technology, to reduce reflections and glare, thereby improving image clarity and contrast. The Mueller matrix is a powerful tool for understanding polarization effects within these systems. Still, there are currently no quick methods for analyzing it across the optical field of view. This webinar introduces a new workflow integrated into Ansys Zemax OpticStudio to simplify obtaining the effective Mueller matrix. This innovation allows users to rapidly create Mueller matrix maps, enhancing polarization control, image quality, and the overall design efficiency of optical systems.

What Attendees will Learn

  • Understand the significance of polarization analysis in optical systems and its impact on reducing reflections and glare
  • Utilize the Mueller matrix to evaluate the polarization state transformations in optical systems
  • Learn how to set an initial polarization state of a single ray on the object surface to obtain an output Stokes vector on the image surface.
  • Use a user-defined surface to define a custom Mueller matrix surface
  • Explore methods to define the field and generate an average Mueller matrix map of the optical system for polarization analysis

Who Should Attend

Optical Engineer, Photonic Engineers, Engineering Management

Speakers

  • Yihua Hsiao, Senior Application Engineer