Join us for a webinar introducing a new workflow integrated into Ansys Zemax OpticStudio to simplify obtaining an effective Mueller matrix. This allows users to rapidly create Mueller matrix maps, enhancing polarization control, image quality, and the overall design efficiency of optical systems.
Venue:
Virtual
Polarization analysis is essential in optical system design, such as in microscopy or display technology, to reduce reflections and glare, thereby improving image clarity and contrast. The Mueller matrix is a powerful tool for understanding polarization effects within these systems. Still, there are currently no quick methods for analyzing it across the optical field of view. This webinar introduces a new workflow integrated into Ansys Zemax OpticStudio to simplify obtaining the effective Mueller matrix. This innovation allows users to rapidly create Mueller matrix maps, enhancing polarization control, image quality, and the overall design efficiency of optical systems.
Optical Engineer, Photonic Engineers, Engineering Management
